Introduction of Tokyo Electron and plasma developments

活动信息

  • 开始时间：网上投稿
  • 活动地点：plasma developments
  • 主讲人：张钰如

活动简介

Presenter:Ryukichi Shimizu

Director - Miyagi Technology Development Center (Sendai, Japan), Sep. 2018 -

- Responsible for advanced process and hardware development of etching tool

Director - Tokyo Electron Taiwan ESBU (Hsinchu, TAIWAN), Sep. 2014 - Aug, 2018

- Responsible for research and development work of etching business in Taiwan.

- Develop manufacturable etching processes for leading-edge technology of logic device.

Director - Etch Product Development Dept. (Sendai, Japan), Nov. 2011 - Nov, 2013

- Responsible for process and product development in Logic MOL/BEOL etching for 22nm and beyond generation.

Sr. Manager - Etch Process Dept. (Albany, NY, US), May. 2007 - Jul. 2008

- Responsible for process development of FEOL and BEOL etch process for 22nm and beyond technology of IBM and alliance partner.

Presentation outline

-Overviews of Tokyo Electron and Tokyo Electron Miyagi

-Etch Process Introduction

üWhere is etch used in chip flow?

üGeneral Etching Concept

üEtch Equipment Overviews

主讲人介绍

Presenter:Ryukichi ShimizuDirector - Miyagi Technology Development Center (Sendai, Japan), Sep. 2018 -- Responsible for advanced process and hardware development of etching toolDirector - Tokyo Electron Taiwan ESBU (Hsinchu, TAIWAN), Sep. 2014 - Aug, 2018- Responsible for research and development work of etching business in Taiwan.- Develop manufacturable etching processes for leading-edge tech...